atomic layer chemical vapor deposition

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• Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

• Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v …   Wikipedia

• Atomic layer deposition — (ALD) is a gas phase chemical process used to create extremely thin coatings. The majority of ALD reactions use two chemicals, typically called s. These precursors react with a surface one at a time in a sequential manner. By exposing the… …   Wikipedia

• Chemical beam epitaxy — (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular… …   Wikipedia

• Deposition (chemistry) — In chemistry, deposition is the settling of particles (atoms or molecules) or sediment from a solution, suspension and mixture or vapor onto a pre existing surface. Deposition generally results in growth of new phase and is of fundamental… …   Wikipedia

• Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some …   Wikipedia

• Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… …   Wikipedia

• химическое осаждение атомарных слоев из паров — То же, что осаждение атомарных слоев [http://www.cscleansystems.com/glossary.html] Тематики полупроводниковые приборы EN ALCVDatomic layer chemical vapor deposition …   Справочник технического переводчика

• Carbon nanotube — Not to be confused with Carbon fiber. Part of a series of articles on Nanomaterials Fullerenes …   Wikipedia

• Ruthenium — (pronEng|ruːˈθiːniəm) is a chemical element that has the symbol Ru and atomic number 44. A rare transition metal of the platinum group of the periodic table, ruthenium is found associated with platinum ores and used as a catalyst in some platinum …   Wikipedia

• Optical fiber — A bundle of optical fibers A TOSLINK fiber optic audio c …   Wikipedia